{"title":"Application of the Kull epilayer formulation to a compact model for junction diodes","authors":"A. DiVergilio","doi":"10.1109/BCICTS45179.2019.8972733","DOIUrl":null,"url":null,"abstract":"This paper presents an application of the Kull-Nagel epilayer formulation for conductivity modulation to a compact model for junction diodes. This enhancement allows for improved accuracy in modeling the bias-dependence of the series resistance, a critical figure of merit for diodes used in RF and switching applications. The model is implemented in Verilog-A as an extension to the 3-terminal electrothermal diode model presented in an earlier work [1]. Hardware-verified results are demonstrated for a 90nm SiGe BiCMOS technology featuring an integrated PIN diode.","PeriodicalId":243314,"journal":{"name":"2019 IEEE BiCMOS and Compound semiconductor Integrated Circuits and Technology Symposium (BCICTS)","volume":"71 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 IEEE BiCMOS and Compound semiconductor Integrated Circuits and Technology Symposium (BCICTS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/BCICTS45179.2019.8972733","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
This paper presents an application of the Kull-Nagel epilayer formulation for conductivity modulation to a compact model for junction diodes. This enhancement allows for improved accuracy in modeling the bias-dependence of the series resistance, a critical figure of merit for diodes used in RF and switching applications. The model is implemented in Verilog-A as an extension to the 3-terminal electrothermal diode model presented in an earlier work [1]. Hardware-verified results are demonstrated for a 90nm SiGe BiCMOS technology featuring an integrated PIN diode.