{"title":"Imaging Latch-Up Sites in LSI CMOS with a Laser Photoscanner","authors":"D. J. Burns, Jeffrey M. Kendall","doi":"10.1109/IRPS.1983.361971","DOIUrl":null,"url":null,"abstract":"A non-destructive laser photoscanning technique has been used to analyze electrically induced latch-up circuit paths in a variety of commercially available bulk CMOS devices. The method and results are compared to those reported by others using electron beam induced current and liquid crystal techniques.","PeriodicalId":334813,"journal":{"name":"21st International Reliability Physics Symposium","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1983-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"12","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"21st International Reliability Physics Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRPS.1983.361971","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 12
Abstract
A non-destructive laser photoscanning technique has been used to analyze electrically induced latch-up circuit paths in a variety of commercially available bulk CMOS devices. The method and results are compared to those reported by others using electron beam induced current and liquid crystal techniques.