Record high gain from InAs avalanche photodiodes at room temperature

Wenlu Sun, S. Maddox, S. Bank, J. Campbell
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引用次数: 5

Abstract

Avalanche photodiodes (APD) are important components in short-wave and mid-wave infrared detection systems (imaging, laser radar, communications, etc.) because their internal gain can improve receiver sensitivity and enables the detection of weak photon fluxes. The statistical nature of impact ionization in APDs contributes to excess shot noise, however. The excess noise factor, F(M), is related to the ratio of the electron and hole ionization coefficients, k, and multiplication, M, by F(M) = <;M<;sup>2<;/sup>>/<;M><;sup>2<;/sup> = k<;M> + (1-k)(2-1/<;M>). In the mid-infrared, HgCdTe APDs represent the current state-of-the-art; at liquid nitrogen temperatures, advanced devices offer excellent low noise characteristics with F(M) ~ 1, gains of >1000, and excellent dark currents. Unfortunately, devices that operate at shorter wavelengths exhibit degraded noise characteristics and significantly lower maximum gains <;30. This, when combined with the growth and fabrication challenges associated with II-VI compounds has motivated the search for alternative APD materials. InAs APDs, which offer a shorter wavelength cutoff wavelength of ~3 μm, have recently been found to exhibit F(M) ~ 1, with moderately low dark current at room temperature. Increasing the multiplication region thickness increases the gains achievable at low bias, which is beneficial for integration with Read Out-Integrated Circuits (ROICs). Therefore, to design a high-gain InAs APD, a thick multiplication region is required. This, in turn, necessitates extremely low background doping (<;1015 cm-3), or appropriate counter doping, in order to realize complete depletion and a uniform electric field profile. In this paper, we report record high-gain InAs APDs employing 6 μm-thick and 10 μm-thick intrinsic regions with low background doping of ~4×1014 cm-3, as determined by C-V profiling. An AlAsSb blocking layer was used in both structures to suppress electron diffusion current, the dominant dark current mechanism at room temperature. Significant reduction in dark current were critical to characterize these thicker multiplication regions at high gain, resulting in record high room temperature multiplication gain of ~300 at 15 V bias. This is ~6× the previous record for InAs of 50 at 15 V, as well as significantly higher than the maximum gain of 126 reported at higher biases, and represents a significant step forward in InAs APD performance.
在室温下从InAs雪崩光电二极管记录高增益
雪崩光电二极管(APD)是短波和中波红外探测系统(成像、激光雷达、通信等)的重要组成部分,其内部增益可以提高接收机灵敏度,实现弱光子通量的探测。然而,apd中撞击电离的统计性质导致了过量的弹丸噪声。多余噪声因子F(M)与电子和空穴电离系数k的比值以及乘以M (F(M) = 2>/2 = k + (1-k)(2-1/))有关。在中红外领域,HgCdTe apd代表了当前最先进的技术;在液氮温度下,先进的器件具有优异的低噪声特性,F(M) ~ 1,增益>1000,以及优异的暗电流。不幸的是,工作在较短波长的器件表现出退化的噪声特性和显著降低的最大增益<;30。这一点,再加上II-VI化合物的生长和制造挑战,促使人们寻找替代APD材料。InAs apd的截止波长较短,约为3 μm,最近发现其在室温下具有较低的暗电流,表现为F(M) ~ 1。增加倍增区厚度可以增加低偏置下的增益,这有利于与读出集成电路(roic)集成。因此,为了设计一个高增益的InAs APD,需要一个厚的倍增区。这就需要极低的本底掺杂(< 1015 cm-3)或适当的反掺杂,以实现完全耗尽和均匀的电场分布。通过C-V谱分析,我们报道了具有6 μm厚和10 μm厚本征区,低背景掺杂~4×1014 cm-3的创纪录高增益InAs apd。在这两种结构中都使用了AlAsSb阻断层来抑制电子扩散电流,这是室温下主要的暗电流机制。在高增益下,暗电流的显著降低对于表征这些更厚的倍增区域至关重要,从而在15 V偏置下实现了创纪录的~300的室温倍增增益。这是先前InAs在15 V时50的记录的6倍,并且显著高于在更高偏置下报道的126的最大增益,并且代表了InAs APD性能的重要进步。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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