Growth stimulation of radish sprouts using discharge plasmas

Abstract

We have investigated growth stimulation of radish sprouts using nonthermal atmospheric pressure He discharge plasmas and low pressure O2 RF discharge plasmas. Seeds of radish sprouts were irradiated by one of these plasmas. After 7 days cultivation, the average length of sprouts with irradiation was 15–60 % longer than those without irradiation. Reactive oxygen species may be involved in the growth stimulation mechanism.