Relationship between Charge Transfer Diffusion Coefficients and Doping Level for electro generated thin PEDOT films on ITO

Alex Palma-Cando, B. Frontana-Uribe, V. Varela-Guerrero
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引用次数: 3

Abstract

Thin films of poly-3,4-ethylene dioxythiophene (PEDOT) were electrodeposited on transparent electrodes of indium tin oxide (ITO) using potentiostatic regime. These films had thicknesses ranging from 15 nm to 60 nm and were studied using UV-vis absorption and chronoamperometric techniques in monomer-free tetrabutylammonium perchlorate/acetonitrile solutions. The charge transfer diffusion coefficient (D) of the films were calculated using Cottrell model for a wide range of potential steps from −1.60 to 1.60 V vs. Ag°/AgNO3. For p-doped films, the highest diffusion coefficients were obtained when a potential of 0.70 V was applied. Moreover, a direct relationship between film thickness and their diffusion coefficients was found for thin PEDOT films showing D values up to 1.4 × 10−9 cm2 s−1 for 60 nm thickness films. These values are remarkably higher than the D of 1.8 × 10−11 cm2 s−1 obtained for spin-coated PEDOT: PSS films of similar thickness.
ITO上电致PEDOT薄膜的电荷转移扩散系数与掺杂水平的关系
采用恒电位法制备了聚3,4-乙烯二氧噻吩(PEDOT)薄膜在氧化铟锡(ITO)透明电极上。这些薄膜的厚度从15 nm到60 nm不等,并在无单体的高氯酸四丁基铵/乙腈溶液中使用紫外-可见吸收和计时电流技术进行了研究。在−1.60 ~ 1.60 V /Ag°/AgNO3电位范围内,利用Cottrell模型计算了膜的电荷转移扩散系数(D)。当电位为0.70 V时,p掺杂膜的扩散系数最高。此外,薄膜厚度与其扩散系数之间存在直接关系,对于60 nm厚度的PEDOT薄膜,其D值高达1.4 × 10−9 cm2 s−1。这些值明显高于相同厚度的自旋涂覆PEDOT: PSS薄膜的D值1.8 × 10−11 cm2 s−1。
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