{"title":"AN APPROACH TO CHIP-INTERNAL CURRENT MONITORING AND MEASUREMENT USING AN ELECTRON BEAM TESTER","authors":"K. Helmreich, P. Nagel, W. Wolz, K. Müller-Glaser","doi":"10.1109/TEST.1991.519517","DOIUrl":null,"url":null,"abstract":"An innovative measurement and imaging technique for electron beam testers is introduced, that promises to expand the present applicability of such systems for chip-internal voltage measurements by the capability of chip-internal current measurement. The theoretical principles of the method are discussed and the effect is calculated analytically for a model arrangement. For more realistic measurement situations, the results of numerical calculations, showing the strength of the effect and its dependency of situational parameters, are presented. First experimental results are added. 1 MOTIVATION During the last years, the market share of mixed-signal designs could be observed to be continously increasing. This tendency led to the introduction of dedicated mixedsignal test systems. For prototype debugging of purely digital circuits, internal measurement tools like electron beam !esters (EBTs) have proved to be valuable and at the moment efforts are undertaken to enhance these tools also for application to mixed-signal circuils. The main task herewith is to improve the voltage resolution of the EBT by reducing system-inherent noise. Thus the measurement of analog voltage signals becomes available at an acceptable signal-to-noise ratio [Gar 871. However, information in analog circuitry is often carried by currents and therefore not accessible for measurement with an electron beam tester. On the other hand, the capability of measuring supply currents to chip internal function blocks would allow for some kind of chipinternal IDDQ technique also in digital circuits [Haw 891. But the task of current measurement on chip-internal wires has been ncglected so far. To date, no mechanism has been presented that allows contactless rno:iitoring and measurement of chip-internal currents using an electron beam technique. Neither the measuremenl of the voltage drop caused by the rcsistance of chip-internal wires nor the evaluation of the deflection of the primary beam due to the magnetic field around a current carrying wire (in the range of some pm/A) provides a practical access to chip-internal currents [He1 911. The following paper will describe a promising approach to such a technique, that exploits the interaction between the magnetic field around a current carrying wire and secondary electrons emitted from its surface. 2 PRINCIPLES The basic interaction between a current and a moving electron (e.g. secondary electron) is established by the magnetic field caused by this current. Therefore, the interaction process is described by Ampere's Law and the Lorentz force, aA at p = -e--eeV@+evx(ZZxAJ","PeriodicalId":272630,"journal":{"name":"1991, Proceedings. International Test Conference","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1991-10-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1991, Proceedings. International Test Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/TEST.1991.519517","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5
Abstract
An innovative measurement and imaging technique for electron beam testers is introduced, that promises to expand the present applicability of such systems for chip-internal voltage measurements by the capability of chip-internal current measurement. The theoretical principles of the method are discussed and the effect is calculated analytically for a model arrangement. For more realistic measurement situations, the results of numerical calculations, showing the strength of the effect and its dependency of situational parameters, are presented. First experimental results are added. 1 MOTIVATION During the last years, the market share of mixed-signal designs could be observed to be continously increasing. This tendency led to the introduction of dedicated mixedsignal test systems. For prototype debugging of purely digital circuits, internal measurement tools like electron beam !esters (EBTs) have proved to be valuable and at the moment efforts are undertaken to enhance these tools also for application to mixed-signal circuils. The main task herewith is to improve the voltage resolution of the EBT by reducing system-inherent noise. Thus the measurement of analog voltage signals becomes available at an acceptable signal-to-noise ratio [Gar 871. However, information in analog circuitry is often carried by currents and therefore not accessible for measurement with an electron beam tester. On the other hand, the capability of measuring supply currents to chip internal function blocks would allow for some kind of chipinternal IDDQ technique also in digital circuits [Haw 891. But the task of current measurement on chip-internal wires has been ncglected so far. To date, no mechanism has been presented that allows contactless rno:iitoring and measurement of chip-internal currents using an electron beam technique. Neither the measuremenl of the voltage drop caused by the rcsistance of chip-internal wires nor the evaluation of the deflection of the primary beam due to the magnetic field around a current carrying wire (in the range of some pm/A) provides a practical access to chip-internal currents [He1 911. The following paper will describe a promising approach to such a technique, that exploits the interaction between the magnetic field around a current carrying wire and secondary electrons emitted from its surface. 2 PRINCIPLES The basic interaction between a current and a moving electron (e.g. secondary electron) is established by the magnetic field caused by this current. Therefore, the interaction process is described by Ampere's Law and the Lorentz force, aA at p = -e--eeV@+evx(ZZxAJ
介绍了一种新型电子束测试仪的测量成像技术,该技术有望通过测量芯片内部电流的能力,扩大现有电子束测试仪在芯片内部电压测量中的适用性。讨论了该方法的理论原理,并对模型布置的效果进行了解析计算。对于更实际的测量情况,给出了数值计算结果,显示了效应的强度及其对情景参数的依赖性。首先补充了实验结果。在过去的几年里,混合信号设计的市场份额不断增加。这种趋势导致了专用混合信号测试系统的引入。对于纯数字电路的原型调试,电子束酯(ebt)等内部测量工具已被证明是有价值的,目前正在努力增强这些工具,以应用于混合信号电路。本文的主要任务是通过降低系统固有噪声来提高EBT的电压分辨率。因此,模拟电压信号的测量在可接受的信噪比[Gar 871]下可用。然而,模拟电路中的信息通常由电流携带,因此无法用电子束测试仪进行测量。另一方面,测量芯片内部功能块的电源电流的能力将允许在数字电路中使用某种芯片内部IDDQ技术[ha891]。但是,芯片内部导线电流测量的工作一直被忽视。到目前为止,还没有一种机制允许使用电子束技术对芯片内部电流进行非接触监测和测量。无论是对芯片内部导线的电阻引起的电压降的测量,还是对载流导线周围的磁场(在一些pm/ a的范围内)引起的主波束偏转的评估,都不能提供对芯片内部电流的实际访问[He1 911]。下面的论文将描述一种很有前途的方法来实现这种技术,即利用载流导线周围的磁场和从其表面发射的二次电子之间的相互作用。电流和运动电子(如二次电子)之间的基本相互作用是由电流产生的磁场建立的。因此,相互作用过程可以用安培定律和洛伦兹力aA at p = -e—eeV@+evx(ZZxAJ)来描述