High voltage Ni/4H-SiC Schottky rectifiers

R. Chilukuri, B. J. Baliga
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引用次数: 10

Abstract

In this paper, we report characteristics of 4H-SiC Ni/Al Schottky rectifiers operating at 1.5 to 2.5 kV and terminated using low energy Ar implants. At room temperature, the nickel Schottky diode exhibited a barrier height of 1.7 eV and an ideality factor of 1.07. After annealing, the Schottky diode fabricated on a 20 /spl mu/m thick epilayer had a forward voltage drop of 1.16 V at 100 A/cm/sup 2/, the lowest value ever reported for a 1.6 kV rectifier. A breakdown voltage of >2500 V was measured on diodes fabricated using 40 /spl mu/m epilayers. The measured specific on-resistance of 20 /spl mu/m and 40 /spl mu/m epi diodes was within /spl sim/1.5/spl times/ of the calculated drift region resistance over a 0-200/spl deg/C temperature range.
高压Ni/4H-SiC肖特基整流器
在本文中,我们报告了工作在1.5至2.5 kV的4H-SiC Ni/Al肖特基整流器的特性,并使用低能量Ar植入端接。在室温下,镍肖特基二极管的势垒高度为1.7 eV,理想因数为1.07。在20 /spl mu/m厚的薄膜上制备的肖特基二极管在100 a /cm/sup 2/时的正向压降为1.16 V,为1.6 kV整流器所报道的最低值。用40 /spl μ m薄膜制备的二极管击穿电压可达>2500 V。在0-200/spl℃温度范围内,20 /spl mu/m和40 /spl mu/m外敏二极管的测量比导通电阻小于计算漂移区电阻的1.5/spl倍。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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