{"title":"Gas discharger generators of ultra-frequency a metal-bearing plasma to etching of piezoelectrics","authors":"L.N. Orlikov, N. L. Orlikov, S. Shandarov","doi":"10.1109/MIAME.1999.827841","DOIUrl":null,"url":null,"abstract":"The etching of lithium niobate in a high-voltage glow discharge with voltage of 10 KV is discussed. Pulsed supply of metal vapors into the etching chamber causes the discharge resignation and the generation of high frequency oscillations. An inductive-capacitate composition in a discharge circuit generates frequency 5 MHz. This helps to remove discharge from the piezoelectric surface and to increase the etching speed to 5 mcm/h.","PeriodicalId":132112,"journal":{"name":"Proceedings of the IEEE - Russia Conference. 1999 High Power Microwave Electronics: Measurements, Identification, Applications. MIA-ME'99 (Cat. No.99EX289)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1999-09-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the IEEE - Russia Conference. 1999 High Power Microwave Electronics: Measurements, Identification, Applications. MIA-ME'99 (Cat. No.99EX289)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MIAME.1999.827841","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
The etching of lithium niobate in a high-voltage glow discharge with voltage of 10 KV is discussed. Pulsed supply of metal vapors into the etching chamber causes the discharge resignation and the generation of high frequency oscillations. An inductive-capacitate composition in a discharge circuit generates frequency 5 MHz. This helps to remove discharge from the piezoelectric surface and to increase the etching speed to 5 mcm/h.