A new V.MOS/Bipolar Darlington transistor for power applications

G. David, J. Vallée, J. Lebailly
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引用次数: 3

Abstract

This paper deals with the design, processing, and electrical characteristics of a new monolithic power device comprising a V.MOS Field-Effect-Transistor as the driver component, and a bipolar low Emitter Concentration Transistor as the power output component. The study of the device has been made on the base of a 3,9 × 3,9 mm2chip. The device design is such that there is a complete compatibility between processing of the multiepitaxial bipolar power transistor and of the V.MOS transistor. The influence of the main parameters of the structure was studied, including : - Channel width of the V.MOS - Gate oxide thickness - Characteristics of the epitaxial layers A diffusion processing insuring a high gain for the bipolar transistor and a low threshold voltage of the V.MOS F.E.T. has been developed. The electrical measurements exhibit nice characteristics for medium voltage applications: - low threshold voltage : Vth< 2,5 V - high forward transconductance : gm> 5 A/V - low saturation voltage drop : Vsat< 1.8 V (for Ic = 10 A, VG= 10 V) - medium breakdow-voltage : BV> 90 V.
一种用于电源应用的新型V.MOS/双极达灵顿晶体管
本文介绍了一种新型单片功率器件的设计、加工和电学特性,该器件由vmos场效应晶体管作为驱动元件,双极低发射极浓度晶体管作为功率输出元件。该器件的研究是在一个3,9 × 3,9 mm2的芯片上进行的。该器件设计使得多外延双极功率晶体管的加工与vmos晶体管的加工完全兼容。研究了vmos的沟道宽度、栅极氧化物厚度、外延层的特性等主要结构参数对该结构的影响,提出了一种保证双极晶体管高增益和低阈值电压的扩散工艺。电学测量在中压应用中表现出良好的特性:低阈值电压:Vth< 2.5 V -高正向跨导:gm> 5 A/V -低饱和压降:Vsat< 1.8 V(对于Ic = 10 A, VG= 10 V) -介质击穿电压:BV> 90 V。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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