Alireza Nassiri, R. Kustom, F. E. Mills, Y. W. Kang, A. Feinerman, H. Henke, P. Matthews, T. L. Willke, D. Grudzien, J. Song, D. Horan
{"title":"A 50-MeV mm-wave electron linear accelerator system for production of tunable short wavelength synchrotron radiation","authors":"Alireza Nassiri, R. Kustom, F. E. Mills, Y. W. Kang, A. Feinerman, H. Henke, P. Matthews, T. L. Willke, D. Grudzien, J. Song, D. Horan","doi":"10.1109/IEDM.1993.347373","DOIUrl":null,"url":null,"abstract":"The Advanced Photon Source (APS) at Argonne in collaboration with the University of Illinois at Chicago and the University of Wisconsin at Madison is developing a new millimeter wavelength, 50-MeV electron linear accelerator system for production of coherent tunable wavelength synchroton radiation. Modern micromachining techniques based on deep etch x-ray lithography, LIGA (Lithografie, Galvanoforming, Abformung), capable of producing high-aspect ratio structures are being considered for the fabrication of the accelerating components.<<ETX>>","PeriodicalId":346650,"journal":{"name":"Proceedings of IEEE International Electron Devices Meeting","volume":"51 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1993-12-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"12","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of IEEE International Electron Devices Meeting","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.1993.347373","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 12
Abstract
The Advanced Photon Source (APS) at Argonne in collaboration with the University of Illinois at Chicago and the University of Wisconsin at Madison is developing a new millimeter wavelength, 50-MeV electron linear accelerator system for production of coherent tunable wavelength synchroton radiation. Modern micromachining techniques based on deep etch x-ray lithography, LIGA (Lithografie, Galvanoforming, Abformung), capable of producing high-aspect ratio structures are being considered for the fabrication of the accelerating components.<>