H. Kurino, T. Matsumoto, K. Yu, N. Miyakawa, H. Itani, H. Tsukamoto, M. Koyanagi
{"title":"Three-dimensional integration technology for real time micro-vision system","authors":"H. Kurino, T. Matsumoto, K. Yu, N. Miyakawa, H. Itani, H. Tsukamoto, M. Koyanagi","doi":"10.1109/ICISS.1997.630262","DOIUrl":null,"url":null,"abstract":"It becomes possible to achieve the real time micro-vision system with extremely high image processing speed if three-dimensional LSI comes into reality because a higher level of parallel processing can be performed in three-dimensional LSI. Then, we have proposed a new three-dimensional integration technology for such real time micro-vision system with high image processing speed. Several key technologies for three-dimensional integration such as formation of buried interconnection and micro-bump, wafer thinning, wafer alignment and wafer bonding have been developed.","PeriodicalId":357602,"journal":{"name":"1997 Proceedings Second Annual IEEE International Conference on Innovative Systems in Silicon","volume":"27 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1997-10-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"18","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1997 Proceedings Second Annual IEEE International Conference on Innovative Systems in Silicon","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICISS.1997.630262","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 18
Abstract
It becomes possible to achieve the real time micro-vision system with extremely high image processing speed if three-dimensional LSI comes into reality because a higher level of parallel processing can be performed in three-dimensional LSI. Then, we have proposed a new three-dimensional integration technology for such real time micro-vision system with high image processing speed. Several key technologies for three-dimensional integration such as formation of buried interconnection and micro-bump, wafer thinning, wafer alignment and wafer bonding have been developed.