30V sub-micron shallow junction planar-MOSFET for DC-DC converters

S. Ono, Y. Yamaguchi, Y. Kawaguchi, A. Nakagawa
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引用次数: 13

Abstract

We present sub-micron shallow p-base planar-DMOSFETs (DMOS: double diffused MOSFET type) for DC-DC converter applications. The shallow junction depth is quite useful to reduce the device on-resistance. It was found that the gate-drain feedback charge can effectively be reduced by adopting a very narrow and shallow JFET region with very high JFET donor concentration, based on the charge compensation theory. An experimental planar DMOSFET with p-base depth of 0.8 /spl mu/m exhibited a breakdown voltage of 34 V, an Ron*Qgd of 14.9 m/spl Omega/nC, and good UIS capability. This is the best value ever reported for a 30 V planar DMOSFET structure.
用于DC-DC变换器的30V亚微米浅结平面mosfet
我们提出亚微米浅p基平面dmosfet (DMOS:双扩散MOSFET类型)用于DC-DC转换器应用。浅结深度对减小器件导通电阻非常有用。基于电荷补偿理论,采用极窄且极浅的JFET供体浓度可以有效地降低栅极-漏极反馈电荷。实验得到p基深度为0.8 /spl mu/m的平面DMOSFET击穿电压为34 V, Ron*Qgd为14.9 m/spl ω /nC,具有良好的UIS性能。这是迄今为止报道的30 V平面DMOSFET结构的最佳值。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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