X. Shi, Yan Yan, Tao Zhou, Xueru Yu, Chen Li, Shoumian Chen, Yuhang Zhao
{"title":"Fast and Accurate Machine Learning Inverse Lithography Using Physics Based Feature Maps and Specially Designed DCNN","authors":"X. Shi, Yan Yan, Tao Zhou, Xueru Yu, Chen Li, Shoumian Chen, Yuhang Zhao","doi":"10.1109/IWAPS51164.2020.9286814","DOIUrl":null,"url":null,"abstract":"To achieve full chip inverse lithography technology (ILT) solution, we proposed a hybrid approach in this study by combining first few physics based feature maps as model input with a specially designed DCNN structure to learn the rigorous ILT algorithm. Our results show that this approach can make machine learning ILT easy, fast and more accurate.","PeriodicalId":165983,"journal":{"name":"2020 International Workshop on Advanced Patterning Solutions (IWAPS)","volume":"4 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-11-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 International Workshop on Advanced Patterning Solutions (IWAPS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IWAPS51164.2020.9286814","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 7
Abstract
To achieve full chip inverse lithography technology (ILT) solution, we proposed a hybrid approach in this study by combining first few physics based feature maps as model input with a specially designed DCNN structure to learn the rigorous ILT algorithm. Our results show that this approach can make machine learning ILT easy, fast and more accurate.