B. L. La Fontaine, D. Gaines, D. Kania, G. Sommargren, S. Baker, D. Ciarlo
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引用次数: 0
Abstract
The performance of an Extreme Ultraviolet Lithography (EUVL) imaging optic was characterized by printing resolution test images in resist. While features as small as 0.137µm were successfuly printed, a resolution of 0.175µm better represents the performance of the system over the full 0.9mm2 image field. The contrast of the aerial image was estimated to be approximately 40% or less for the fine features printed. This low contrast value is attributed to a degradation of the modulation transfer function (MTF) due to the presence of scattered light in the image.