Modelling the Performance of Photochromic Thin Films to Achieve Super-resolution Nanopatterning by Absorbance Modulation at Low Light Intensity

Abstract

This paper presents a comprehensive model and simulation results of the performance and governing factors of the photochromic layer in Absorbance-Modulation-Optical-Lithography (AMOL) and examines the possibility of performing AMOL at low light intensities.