An low-energy 8T dual-port SRAM for image processor with selective sourceline drive scheme in 28-nm FD-SOI process technology

Haruki Mori, Tomoki Nakagawa, Yuki Kitahara, Y. Kawamoto, Kenta Takagi, S. Yoshimoto, S. Izumi, H. Kawaguchi, M. Yoshimoto
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引用次数: 5

Abstract

This paper presents a low-energy and low-voltage 64-kb 8T dual-port image memory in a 28-nm FD-SOI process technology. Our proposed SRAM adopts the selective sourceline drive (SSD) scheme and the consecutive data write technique for improving active energy efficiency at the low voltage. We fabricated a 64-Kb 8T dual-port SRAM in the 28-nm FD-SOI process technology; the test chip exhibits 0.48 V operation and an access time of 135 ns. The energy minimum point is at a supply voltage of 0.56 V and an access time of 35 ns, where 265.0 fJ/cycle in write operation and 389.6 fJ/cycle in read operation are achieved; these factors are 30% and 26% smaller than those in the 8T dual-port SRAM with the conventional selective sourceline control (SSLC) scheme, respectively.
采用28nm FD-SOI制程技术的低功耗8T双端口SRAM图像处理器,具有选择性源端驱动方案
本文提出一种采用28纳米FD-SOI制程技术的低功耗、低电压64kb 8T双端口图像存储器。我们提出的SRAM采用选择性源端驱动器(SSD)方案和连续数据写入技术,以提高低电压下的有功能效。采用28nm FD-SOI工艺制备了64kb的8T双端口SRAM;测试芯片的工作电压为0.48 V,访问时间为135 ns。电源电压为0.56 V,存取时间为35 ns时,能量最低值为写操作265.0 fJ/cycle,读操作389.6 fJ/cycle;这些因素分别比采用传统选择性源端控制(SSLC)方案的8T双端口SRAM小30%和26%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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