Fast stability analysis of large-scale SRAM arrays and the impact of NBTI degradation

S. Drapatz, T. Fischer, K. Hofmann, E. Amirante, P. Huber, M. Ostermayr, G. Georgakos, D. Schmitt-Landsiedel
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引用次数: 5

Abstract

This paper presents Read Margin analysis for large SRAM arrays with a fast test method that even can be realized in dual-VDD product chips. Classical Static Noise Margin (SNM) is mostly suitable for single-cell simulation. Read Margin (RM) measurement allows analysis of large arrays and correlates to SNM, but requires a dedicated teststructure and long measurement time. The presented method analyzes the flipping of cells over varying supply voltage. The stability of large arrays can be characterized in read as well as in hold state depending on the state of the access transistors. Applying this method, the impact of Negative Bias Temperature Instability (NBTI) is demonstrated on both Read and Hold Margin in a 65 nm low power technology.
大规模SRAM阵列的快速稳定性分析及NBTI退化的影响
本文提出了一种可以在双vdd产品芯片上实现的快速测试方法来分析大型SRAM阵列的读余量。经典的静态噪声裕度(SNM)主要适用于单细胞仿真。读取余量(RM)测量允许分析大型阵列并与SNM相关,但需要专用的测试结构和较长的测量时间。该方法分析了电池在不同电源电压下的翻转。大型阵列的稳定性可以表征为读取状态和保持状态,这取决于接入晶体管的状态。应用该方法,在65纳米低功耗技术中证明了负偏置温度不稳定性(NBTI)对读取和保持裕度的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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