Application of hot-carrier reliability simulation to memory and ASIC design

P.M. Lee, H. Sato
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引用次数: 0

Abstract

We have applied hot-carrier circuit-level reliability simulation to memory and ASIC logic products. We used two different approaches: for memory products we applied circuit-level simulation to entire circuits to over 12k transistors, so that areas with the worst degradation are not missed due to simulating only certain circuit blocks. We present applications to DRAM and SRAM products, and a design curve to directly relate device-level degradation to circuit degradation. For 0.18 /spl mu/m and 0.14 /spl mu/m logic products, we analyzed simple inverters to create design guidelines for maximum transition time to screen delay library cells to ensure adequate reliability. At 200 MHz, maximum transition time (0-100%) was 0.8 ns (17% or duty) for speed degradation of 5% after a 10-year operating lifetime. Analyzing an 800,000 net product required only a couple of hours. We screened out 30 nets, which were later judged reliable due to their reduced signal duty.
热载波可靠性仿真在存储器和专用集成电路设计中的应用
我们已将热载流子电路级可靠性仿真应用于存储器和ASIC逻辑产品。我们使用了两种不同的方法:对于存储产品,我们将电路级模拟应用于超过12k晶体管的整个电路,这样就不会因为只模拟某些电路块而错过退化最严重的区域。我们提出了在DRAM和SRAM产品上的应用,以及一条设计曲线,将器件级退化与电路退化直接联系起来。对于0.18 /spl mu/m和0.14 /spl mu/m逻辑产品,我们分析了简单的逆变器,以创建最大过渡时间到屏幕延迟库单元的设计准则,以确保足够的可靠性。在200 MHz下,10年工作寿命后速度下降5%,最大过渡时间(0-100%)为0.8 ns(17%或占空)。分析一个80万的净产品只需要几个小时。我们筛选出了30个网络,这些网络后来被认为是可靠的,因为它们的信号负荷降低了。
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