Electromigration in Lead-Free Sn3.8Ag0.7Cu Solder Reaction Couple

Hongwen He, Guangchen Xu, H. Hao, F. Guo
{"title":"Electromigration in Lead-Free Sn3.8Ag0.7Cu Solder Reaction Couple","authors":"Hongwen He, Guangchen Xu, H. Hao, F. Guo","doi":"10.1109/ICEPT.2007.4441425","DOIUrl":null,"url":null,"abstract":"Electromigration is one of the severe reliability problems in IC progress. In this paper, the electromigration of eutectic Sn3.8Ag0.7Cu solder reaction couples were studied under high temperature (150degC) and high current density (5times103 A/cm2) in three days. An original design which could reduce the local Joule heating caused by current crowding was produced. Voltage change was also monitored during this experiment. Hillocks and valleys were found at the anode side and cathode side respectively. Unlike aging test, electromigration could promote the formation of intermetallic compound (IMC) at cathode side and inhibit the formation of IMC at anode side. Cracks also appeared along the cathode side after electromigration in three days, but they were not leading the solder reaction couple to failure.","PeriodicalId":325619,"journal":{"name":"2007 8th International Conference on Electronic Packaging Technology","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2007 8th International Conference on Electronic Packaging Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICEPT.2007.4441425","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4

Abstract

Electromigration is one of the severe reliability problems in IC progress. In this paper, the electromigration of eutectic Sn3.8Ag0.7Cu solder reaction couples were studied under high temperature (150degC) and high current density (5times103 A/cm2) in three days. An original design which could reduce the local Joule heating caused by current crowding was produced. Voltage change was also monitored during this experiment. Hillocks and valleys were found at the anode side and cathode side respectively. Unlike aging test, electromigration could promote the formation of intermetallic compound (IMC) at cathode side and inhibit the formation of IMC at anode side. Cracks also appeared along the cathode side after electromigration in three days, but they were not leading the solder reaction couple to failure.
无铅Sn3.8Ag0.7Cu焊料反应偶的电迁移
电迁移是集成电路发展中严重的可靠性问题之一。本文研究了高温(150℃)和高电流密度(5倍103 A/cm2)下共晶Sn3.8Ag0.7Cu焊料反应对在3天内的电迁移过程。提出了一种新颖的减小电流拥挤引起的局部焦耳热的设计方案。实验过程中还监测了电压变化。在阳极侧和阴极侧分别发现了丘陵和山谷。与时效试验不同,电迁移可以促进阴极侧金属间化合物(IMC)的形成,抑制阳极侧金属间化合物(IMC)的形成。电迁移3天后阴极侧也出现了裂纹,但并未导致焊料反应对失效。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信