Holographic grating formation by wet etching in amorphous As/sub 40/Ge/sub 10/Se/sub 15/S/sub 30/ thin film

Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468) Pub Date : 2001-10-31 DOI:10.1109/IMNC.2001.984166

Jong-Hwa Park, Jeong-Il Park, H. Chung

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Abstract

Amorphous As/sub 40/Ge/sub 10/Se/sub 15/S/sub 30/ thin films have been studied with the aim of identifying optimum etching conditions that can be used to produce holographic grating structure for use as diffractive optical elements. In this study, we have fabricated a holographic grating with the method of wet etching using 0.26N NaOH. The diffraction efficiency was obtained by +1st order intensity of the diffracted beam. The formed grating profiles were observed by an atomic force microscope and showed that the expected grating profile could be achieved by controlling the etching time.

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非晶As/sub 40/Ge/sub 10/Se/sub 15/S/sub 30/薄膜湿法刻蚀全息光栅

对非晶As/sub 40/Ge/sub 10/Se/sub 15/S/sub 30/薄膜进行了研究，目的是确定可用于制作衍射光学元件全息光栅结构的最佳蚀刻条件。在本研究中，我们采用0.26N NaOH湿法刻蚀的方法制作了全息光栅。衍射效率由衍射光束的+一阶强度得到。用原子力显微镜观察了形成的光栅轮廓，结果表明，通过控制刻蚀时间可以达到预期的光栅轮廓。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468)

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