An Optimum Design of the Carbon Nanotube Field Effect Transistor for Analog Applications in 10 nm Technology

W. H. Chua, C. Uttraphan, B. C. Kok
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Abstract

Complementary metal oxide semiconductor (CMOS) technology has encountered the challenges in scaling beyond 5 nm in recent years, hence, limiting further performance improvement. The carbon nanotube field-effect transistor (CNFET) has potential to replace the metal oxide semiconductor field effect transistor (MOSFET) due to its similar electrical properties and fabrication processes, with better performance. In this paper, we present an optimum design of a two-stage CNFET operational amplifier (op-amp) in 10 nm technology. The optimum design is achieved considering the analog performance metrics such as the open-loop gain, gain bandwidth, power dissipation, and output resistance. The structural parameters of the CNFET, the number of carbon nanotubes (CNTs) N, CNT diameter DCNT, and inter-CNT spacing S were altered and simulated against the performance metrics to observe the variation of the performance metrics. Based on the simulation results, higher value of structural parameters offers higher performances without at the cost of higher power dissipation. In this work, the achieved optimum value of N, DCNT, and S of 11, 1.7 nm, and 20 nm, respectively.
10纳米模拟应用碳纳米管场效应晶体管的优化设计
近年来,互补金属氧化物半导体(CMOS)技术在5nm以上的尺度上遇到了挑战,因此限制了进一步的性能改进。碳纳米管场效应晶体管(CNFET)具有与金属氧化物半导体场效应晶体管(MOSFET)相似的电学性能和制造工艺,具有取代MOSFET的潜力。在本文中,我们提出了一个优化设计的两级CNFET运算放大器(运放)在10纳米技术。考虑开环增益、增益带宽、功耗和输出电阻等模拟性能指标,实现了最佳设计。改变CNFET的结构参数、碳纳米管(CNT)数量N、碳纳米管直径DCNT和碳纳米管间距S,并根据性能指标进行模拟,观察性能指标的变化。仿真结果表明,结构参数值越高,性能越好,且不需要付出更高的功耗代价。在这项工作中,N、DCNT和S的最佳值分别为11 nm、1.7 nm和20 nm。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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