Signal integrity problems in deep submicron arising from interconnects between cores

P. Nordholz, D. Treytnar, J. Otterstedt, H. Grabinski, D. Niggemeyer, T. Williams
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引用次数: 52

Abstract

The SIA Roadmap shows a very aggressive drive to deep submicron designs. A significant corner stone in the industries' ability to utilize this tremendous capabilities is the usage of reusable cores. When employing cores, one must be sensitive to the quality of the interconnects which will carry signals between cores and the ASIC portion of the network. In this work we will use an extremely accurate line simulator which solves the transmission line equations derived from Maxwell's equations for the simulation of line systems. We will show that the coupling between bus lines is significant, since the signal delay can be increased and even hazards can occur. Furthermore, these effects depend on the set of input signals of all bus lines and the skew between the individual input signals. The lines' cross sections are taken from the SIA Roadmap going from 0.35 /spl mu/m technology design down to 0.10 /spl mu/m technology design.
深亚微米中芯间互连引起的信号完整性问题
SIA路线图显示了对深亚微米设计的积极推动。工业能够利用这种巨大功能的一个重要基石是可重用核心的使用。当使用核心时,必须对互连的质量敏感,互连将在核心和网络的ASIC部分之间传递信号。在这项工作中,我们将使用一个非常精确的线路模拟器,它解决了由麦克斯韦方程组导出的传输线方程,用于模拟线路系统。我们将展示总线线路之间的耦合是显著的,因为信号延迟可能会增加,甚至可能发生危险。此外,这些影响取决于所有总线线路的输入信号集和各个输入信号之间的偏差。线条的横截面取自SIA路线图,从0.35 /spl mu/m的技术设计到0.10 /spl mu/m的技术设计。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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