Highlights of the 2002 national electronic manufacturing technology roadmaps and their applicability to China

R. Pfahl
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Abstract

This presentation describes the roadmapping process used in North America, highlights key global results of the 2002 edition, and suggests how this roadmap and the roadmap process might benefit the electronics industry in China. The 2002 national electronic manufacturing technology roadmap (NEMI, 2002) was released by NEMI on April 1, 2003. This edition of the biennial roadmap is over 1000 pages long and was produced by over 350 individuals from over 170 industrial, government, and academic institutions in North America in cooperation with SIA (Semiconductor Industry Association), IRC, IMAPS (International Microelectronics and Packaging Society), USDC (United States Display Consortium), NSIC (National Storage Industry Consortium), and OIDA (Optoelectronics Industry Development Association). It contains eighteen individual technology roadmaps covering all aspects of the global electronics industry and its supply chain.
2002年国家电子制造技术路线图的亮点及其在中国的适用性
本报告描述了在北美使用的路线图过程,重点介绍了2002年版的主要全球结果,并建议该路线图和路线图过程如何使中国的电子工业受益。2002年国家电子制造技术路线图(NEMI, 2002)由NEMI于2003年4月1日发布。这个两年一次的路线图超过1000页,由来自北美170多个工业,政府和学术机构的350多位个人与SIA(半导体工业协会),IRC, IMAPS(国际微电子和封装协会),USDC(美国显示联盟),NSIC(国家存储产业联盟)和OIDA(光电子工业发展协会)合作制作。它包含18个单独的技术路线图,涵盖了全球电子工业及其供应链的各个方面。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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