Effect of growth temperature on the material properties of PLD-grown Bi2Te3 and Sb2Te3

Muneer Shaik, I. Abdel-Motaleb
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引用次数: 2

Abstract

Bismuth Telluride (Bi2Te3) and Antimony Telluride (Sb2Te3) are the preferable materials for building thermoelectric devices. Pulsed Laser Deposition (PLD) is one of the techniques used to grow these materials. To study the effect of temperature growth on the properties of the materials, thin films were PLD-deposited on n-type Silicon substrate in Argon (Ar) atmosphere. Substrate temperatures changed from 25 °C to 450 °C. The surface morphology of the films was studied using Atomic Force Microscopy (AFM) and their crystal properties were studied using X-ray Diffraction (XRD) analysis. The effect of the growth temperature on the material properties was investigated. AFM scans show how temperature affects the surface morphology. XRD results show that all the films are polycrystalline, and at higher temperatures both films have specific preferred orientations, namely along the (006) and (00 15) planes. Both Bi2Te3 and Sb2Te3 were found to have hexagonal crystal lattice structure with lattice constants a = 4.396 Å and c = 30.486 Å for Bi2Te3 and a = 5.075 Å and c = 30.451 Å for Sb2Te3. The grain sizes of all the films were calculated using Scherrer formula and plotted as a function of temperature for both the materials.
生长温度对pld生长的Bi2Te3和Sb2Te3材料性能的影响
碲化铋(Bi2Te3)和碲化锑(Sb2Te3)是制造热电器件的较好材料。脉冲激光沉积(PLD)是用于生长这些材料的技术之一。为了研究温度增长对材料性能的影响,在氩气气氛下在n型硅衬底上沉积了pld薄膜。衬底温度从25°C变化到450°C。利用原子力显微镜(AFM)研究了薄膜的表面形貌,并用x射线衍射仪(XRD)分析了薄膜的晶体性质。研究了生长温度对材料性能的影响。原子力显微镜扫描显示温度如何影响表面形貌。XRD结果表明,两种膜均为多晶,在较高温度下,两种膜均具有特定的择优取向,即沿(006)面和(0015)面。发现Bi2Te3和Sb2Te3均具有六方晶格结构,晶格常数分别为a = 4.396 Å和c = 30.486 Å, Sb2Te3为a = 5.075 Å和c = 30.451 Å。使用Scherrer公式计算了所有薄膜的晶粒尺寸,并绘制了两种材料的温度函数图。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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