Growth and characterization of β-In2S3 thin films prepared by chemical spray pyrolysis technique with and without alcoholic solution

T. Sall, B. M. Soucase, M. Mollar, M. Aggour, M. Fahoume, H. Ullah
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Abstract

Beta indium sulfide (β-In2S3) thin films were deposited by Chemical Spray Pyrolysis technique, a fast, cost effective and vacuum free method with alcoholic and aqueous solution using InCl3 and thiourea as source of indium and sulfur respectively. All films were deposited onto glass substrate with different temperatures. Characterization of the films was carried out by X-ray diffraction (XRD), Scanning Electron Microscopy (SEM), Energy Dispersive Spectroscopy (EDS), Atomic Force Microscopy (AFM) and optical transmission. The structural analysis reveals films with (0 0 12) as main peak for all samples in all case. (107) peak appeared only in films deposited without alcohol with high intensity at 300°C substrate temperature. SEM images shows films dense, continuous, compact and homogeneous without void but one noted cracks in films prepared from aqueous solution. EDS tables show the presence of sulfur and indium in all samples with good stoichiometry. AFM micrographs reveal rough films and variation of grains size. Optical analysis to determine band gap gives band gap varying from 2.54eV to 2.81eV for samples deposited from aqueous solution and band gap between 2.70eV to 2.89eV for samples prepared from alcoholic solution.
化学喷雾热解法制备β-In2S3薄膜的生长与表征
采用快速、经济、无真空的化学喷雾热解技术,以硫化镍和硫脲分别作为铟和硫的来源,在酒精和水溶液中制备了β-硫化铟(β-In2S3)薄膜。所有薄膜在不同温度下沉积在玻璃基板上。采用x射线衍射(XRD)、扫描电镜(SEM)、能谱(EDS)、原子力显微镜(AFM)和光透射等方法对膜进行了表征。结构分析表明,在所有情况下,所有样品的主峰均为(0 ~ 12)。(107)峰只出现在无醇高强度沉积膜中,基底温度为300℃。扫描电镜图像显示,水溶液制备的薄膜致密、连续、致密、均匀,无空洞,但有明显的裂纹。EDS表显示了所有样品中硫和铟的存在,具有良好的化学计量学。AFM显微照片显示了粗糙的薄膜和晶粒尺寸的变化。光学分析,以确定带隙的带隙变化从2.54eV至2.81eV的样品沉积的水溶液和带隙之间的2.70eV至2.89eV的样品制备的酒精溶液。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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