Determination of the Reliability of AlGaN/GaN HEMTs through Trap Detection Using Optical Pumping

D. Cheney, R. Deist, J. Navales, B. Gila, F. Ren, S. Pearton
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引用次数: 2

Abstract

When illuminated with below band-gap light, the response of the drain current of AlGaN/GaN High Electron Mobility Transistors (HEMTs) was measured. The energy of the wavelength of light corresponds to the trapping and de-trapping of carriers within the band-gap, providing an indicator of trap densities. These changes were compared on HEMTs with gate lengths of 0.14 & 0.17 μm, before and after electrically stressing under on-state (VG = 0 V), off-state (VG =-5 V), and typical operating conditions (VG = -2V) indicating a change in trap density as a result of electrical stressing, since the energy from a specific wavelength of light pumps traps whose activation energies are less than or equal to that of the light source. Changes in trap densities were minimal after both off-state and on-state stressing but significant trap creation in the range EC=-0.4-0.6 eV were observed in HEMTs exhibiting gradual degradation during stressing. Energy levels corresponding to these values in the literature have been suggested to correlate GaN and NGa substitutional defects, as well as GaI interstitials.
利用光泵浦陷阱检测测定AlGaN/GaN hemt的可靠性
在带隙以下光照射下,测量了AlGaN/GaN高电子迁移率晶体管(HEMTs)漏极电流的响应。光波长的能量对应于带隙内载流子的捕获和释放,提供了捕获密度的指示。这些变化在栅极长度为0.14和0.17 μm的hemt上进行了比较,在导通状态(VG = 0 V)、关断状态(VG =-5 V)和典型工作条件(VG = -2V)下,这些电应力前后的变化表明,由于电应力导致了陷阱密度的变化,因为来自特定波长的光泵的能量捕获的活化能小于或等于光源的活化能。在非状态和开启状态应力作用下,陷阱密度的变化都很小,但在EC=-0.4-0.6 eV范围内,hemt的陷阱产生显著,在应力作用下逐渐降解。在文献中,与这些值相对应的能级被认为与GaN和NGa取代缺陷以及GaI间隙有关。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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