GaAs MESFET digital integrated circuits fabricated with low temperature buffer technology

M. Delaney, C. Chou, L. Larson, J. Jensen, D. Deakin, A. Brown, W. Hooper, M. Thompson, L. McCray, S. Rosenbaum
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引用次数: 2

Abstract

High-performance digital integrated circuits have been fabricated with low-temperature buffer GaAs MESFET technology. The materials structure eliminates side-gating and light sensitivity, and improves FET performance. Individual transistors with a 0.2-μm gate length have a transconductance gm of 600 mS/mm and an extrapolated cutoff frequency fT of 80 GHz. Static SCFL frequency dividers fabricated in this technology exhibit a maximum clock rate of 22 GHz
采用低温缓冲技术制备GaAs MESFET数字集成电路
利用低温缓冲GaAs MESFET技术制备了高性能数字集成电路。该材料结构消除了侧门控和光敏感性,提高了FET性能。栅极长度为0.2 μm的单个晶体管的跨导gm为600 mS/mm,外推截止频率fT为80 GHz。采用该技术制造的静态SCFL分频器最大时钟速率为22 GHz
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