R. Muralidhar, R. Dennard, T. Ando, I. Lauer, T. Hook
{"title":"Advanced FDSOI design: The U-channel device for 7nm node and beyond","authors":"R. Muralidhar, R. Dennard, T. Ando, I. Lauer, T. Hook","doi":"10.1109/S3S.2017.8308747","DOIUrl":null,"url":null,"abstract":"Planar ultra-thin body and box (UTBB1–3) fully depleted silicon on insulator (FDSOI) devices have many advantages for future low-cost energy-efficient applications. However, process steps for scaling to ultra-thin FDSOI devices can be difficult to control, and extrinsic resistance can hinder any performance improvement. In this paper, we present a novel planar U-channel UTBB FDSOI device that can alleviate these problems.","PeriodicalId":333587,"journal":{"name":"2017 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S)","volume":"20 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2017-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2017 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/S3S.2017.8308747","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Planar ultra-thin body and box (UTBB1–3) fully depleted silicon on insulator (FDSOI) devices have many advantages for future low-cost energy-efficient applications. However, process steps for scaling to ultra-thin FDSOI devices can be difficult to control, and extrinsic resistance can hinder any performance improvement. In this paper, we present a novel planar U-channel UTBB FDSOI device that can alleviate these problems.