Impact of cryogenic temperature operation on static and low frequency noise behaviors of FD UTBOX nMOSFETs

B. Nafaa, B. Crețu, N. Ismail, O. Touayar, E. Simoen
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引用次数: 1

Abstract

Unusual peaks in the transconductance gm(VGS) characteristics of n-channel UTBOX devices have been evidenced at 10 K and 77 K operation for an applied front gate voltage around 1.1 V while the back gate is grounded. The origin of this behavior was also addressed using additional low frequency noise (LFN) measurements. It is believed that the unusual peak may be related to a tunneling effect through dopants diffused from source/drain extensions in the channel. Low frequency noise spectroscopy around 77 K confirms the presence of boron in the Si film. Back gate biased in accumulation mode at 77 K operation evidenced an additional transconductance peak behavior which may be attributed to the linear kink effect.
低温工作对FD UTBOX nmosfet静态和低频噪声行为的影响
n通道UTBOX器件的跨导gm(VGS)特性在10 K和77 K的工作条件下被证明是不寻常的峰值,前置栅极电压约为1.1 V,而后门接地。通过额外的低频噪声(LFN)测量,也解决了这种行为的起源。人们认为,这种异常峰可能与通道中源/漏扩展处扩散的掺杂剂产生的隧穿效应有关。在77k附近的低频噪声光谱证实了硅膜中硼的存在。在77 K操作下,后门偏置在积累模式下证明了额外的跨导峰值行为,这可能归因于线性结效应。
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