Velocity overshoot effects and transit times in III-V nitride HFETs : a Monte Carlo study

M. Singh, Yuh‐Renn Wu, J. Singh
{"title":"Velocity overshoot effects and transit times in III-V nitride HFETs : a Monte Carlo study","authors":"M. Singh, Yuh‐Renn Wu, J. Singh","doi":"10.1109/DRC.2004.1367828","DOIUrl":null,"url":null,"abstract":"Monte Carlo simulation of AlGaN/GaN HEMTs were carried out and compared with GaAs based devices. The following outcomes of our simulations are noteworthy: i) partially due to the relatively heavy electron effective mass in GaN, the velocities of the electrons are mostly below the steady state values through most of the channel; ii) unlike what is observed in GaAs based short channel devices, there is no pronounced overshoot effect, even at high drain source biases, due to increased scattering; iii) our simulations show that the suppression of overshoot is directly related to the length of the high field region. This length is quite small for usual bias conditions. We suggest that a non-uniform composition of the barrier region could conceivably help in spreading out the high field region, which is present at the drain end of the device. Other results of the Monte Carlo simulation include transconductance, noise information and unity current gain frequency.","PeriodicalId":385948,"journal":{"name":"Conference Digest [Includes 'Late News Papers' volume] Device Research Conference, 2004. 62nd DRC.","volume":"21 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-06-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Conference Digest [Includes 'Late News Papers' volume] Device Research Conference, 2004. 62nd DRC.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DRC.2004.1367828","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

Monte Carlo simulation of AlGaN/GaN HEMTs were carried out and compared with GaAs based devices. The following outcomes of our simulations are noteworthy: i) partially due to the relatively heavy electron effective mass in GaN, the velocities of the electrons are mostly below the steady state values through most of the channel; ii) unlike what is observed in GaAs based short channel devices, there is no pronounced overshoot effect, even at high drain source biases, due to increased scattering; iii) our simulations show that the suppression of overshoot is directly related to the length of the high field region. This length is quite small for usual bias conditions. We suggest that a non-uniform composition of the barrier region could conceivably help in spreading out the high field region, which is present at the drain end of the device. Other results of the Monte Carlo simulation include transconductance, noise information and unity current gain frequency.
III-V型氮化hfet的速度超调效应和传输时间:蒙特卡罗研究
对AlGaN/GaN hemt进行了蒙特卡罗模拟,并与基于GaAs的器件进行了比较。我们的模拟结果值得注意:1)部分由于氮化镓中相对较重的电子有效质量,电子通过大部分通道的速度大多低于稳态值;ii)与在基于砷化镓的短通道器件中观察到的不同,由于散射增加,即使在高漏源偏置下,也没有明显的超调效应;Iii)我们的模拟表明,超调的抑制与高场区域的长度直接相关。这个长度对于通常的偏置条件是相当小的。我们建议,非均匀组成的势垒区域可能有助于扩散高场区域,这是存在于器件的漏极。蒙特卡罗仿真的其他结果包括跨导、噪声信息和单位电流增益频率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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