Mid-infrared photoluminescence of PbSe film structures up to room temperature

Z. Dashevsky, V. Kasiyan, G. Radovsky, E. Shufer, M. Auslender
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引用次数: 12

Abstract

Lead salt materials are of high interest for midinfrared optical emitters and detectors for molecular spectroscopy. The IV-VI narrow gap semiconductors have a multivalley band structure with band extrema at the L point of the Brillioun zone. Due to the favorable mirrorlike band structure, the nonradiative Auger recombination is reduced by one or two orders of magnitude below that of narrow gap III-V and II-VI semiconductor compounds1. The photoluminescence in the midinfrared range for PbSe film structures, excited by a semiconductor laser diode, is investigated. The PbSe films were prepared by Physical Vapor Deposition (PVD) using an electron gun. A PbSe crystal doped with 0.1 at% Bi was used as a source for the fabrication of thin layers. Starting from the assumption that the rate of nucleation is a predominate factor in determining grain size, thin films were fabricated on substrates that had been maintained at various temperatures of deposition process2. Amorphous glass and Kapton polyimide film was used as substrate. The growth rate was 0.2 nm/s. Films were thermally treated at high oxygen pressure in a heated encapsulated system. Microstructure has been studied using XRD, AFM and HRSEM. For PbSe structures photoluminescence at temperature as high as 300 K is demonstrated.
室温下PbSe薄膜结构的中红外光致发光
铅盐材料是中红外发射体和分子光谱探测器的重要材料。IV-VI窄隙半导体具有多谷能带结构,在亮带的L点处有能带极值。由于有利的镜面带结构,非辐射俄歇复合比窄间隙III-V和II-VI半导体化合物低一到两个数量级1。研究了在半导体激光二极管的激励下,PbSe薄膜结构在中红外范围内的光致发光。采用电子枪物理气相沉积(PVD)法制备PbSe薄膜。用掺有0.1 at% Bi的PbSe晶体作为制备薄层的源。假设成核速率是决定晶粒尺寸的主要因素,在沉积过程中保持不同温度的基底上制备薄膜2。采用非晶玻璃和卡普顿聚酰亚胺薄膜作为衬底。生长速率为0.2 nm/s。薄膜在加热封装系统中在高氧压力下进行热处理。采用XRD、AFM和HRSEM对其微观结构进行了研究。对于PbSe结构,可以在高达300 K的温度下实现光致发光。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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