Best Practice for On-Wafer Millimeter Wave Noise Figure Measurements

Alberto Rodriguez, L. Dunleavy, P. Kirby
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引用次数: 8

Abstract

Equations are developed for convenient, but rigorous, corrections to on-wafer noise figure measurements based on the radiometer equation. The suitability of the approach for millimeter-wave measurements is demonstrated by presenting measured results for a W-Band (75-110GHz) MMIC low-noise amplifier (LNA). The measured quantities are vector-corrected to specified measurement planes by processing received noise temperatures (or noise power) and applying the developed equations to the measured system characteristics, such as probe S-parameters and noise source reflection coefficients. This technique provides a more rigorous treatment of the losses and mismatches present in a measurement system, yielding more accurate noise figure results compared to those obtained using scalar-corrected quantities. The results for the selected LNA show the noise figure to be on the order of 4 dB over 93-95 GHz, with an average discrepancy of 0.7 dB between noise figure corrections using only scalar loss information and the rigorous noise figure corrections based on vector S-parameter corrections presented here.
片上毫米波噪声图测量的最佳实践
方程开发方便,但严格的,修正晶片上的噪声系数测量基于辐射计方程。通过对w波段(75-110GHz) MMIC低噪声放大器(LNA)的测量结果,证明了该方法对毫米波测量的适用性。通过处理接收到的噪声温度(或噪声功率),并将所开发的方程应用于测量的系统特性,如探头s参数和噪声源反射系数,将测量量矢量校正到指定的测量平面。该技术对测量系统中存在的损失和不匹配提供了更严格的处理,与使用标量校正量获得的结果相比,产生了更准确的噪声系数结果。所选LNA的结果显示,在93-95 GHz范围内噪声系数约为4 dB,仅使用标量损耗信息的噪声系数校正与基于矢量s参数校正的严格噪声系数校正之间的平均差异为0.7 dB。
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