Proposal of a fitting accuracy metric suitable for compact model qualification in all MOSFET operation regions

H. Sakamoto, T. Iizuka
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Abstract

Proposed is a fitting accuracy metric suitable for compact model qualification in all MOSFET operation regions. Fitting accuracy is quantified with a logarithmic deviation of simulated characteristics (such as current) from their measurement counterparts, normalized with the logarithmic deviation amplitude estimated with processs-kewed parameters (corner model). The use of this new metric successfully captures, in all MOSFET operation regions, a “hot spot” where fitting accuracy is compromised. With this knowledge, circuit designers would be able to take a necessary precaution by adding a right amount of margin on top of existing ones.
提出了一种适用于所有MOSFET工作区域的紧凑模型鉴定的拟合精度度量
提出了一种适用于所有MOSFET工作区域的紧凑模型鉴定的拟合精度度量。拟合精度通过模拟特征(如电流)与测量特征的对数偏差来量化,并通过过程参数(角模型)估计的对数偏差幅度进行归一化。在所有MOSFET操作区域中,使用这种新度量成功捕获了拟合精度受到损害的“热点”。有了这些知识,电路设计人员就可以采取必要的预防措施,在现有的边缘上增加适量的边缘。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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