Voids in First-Level Interconnects and Their Impact on Solder Joint Reliability

K. Lee, K. Oi, S. Lim, Yvonne Yeo, K. Sweatman, T. Ono, K. Murayama, S. Martell, H. Shimamoto, M. Tsuriya
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Abstract

The presence of voids in first-level interconnects (FLI) is an unknown reliability concern. This paper presents the study of void formation in the interconnects, the inspection capability of void detection and the reliability impact of the voids in electromigration, thermal cycle and thermal shock tests. The first phase of this work has made it possible to define process recipes that can consistently build test packages with and without solder voids. X-ray inspection has been used to determine the level of voiding in the test packages. The second phase of this work has focused on subjecting the test packages to the said reliability tests. A comparison has been made between test packages with solder voids and test packages without solder voids. A conclusion that can be derived from the test data is that test packages with solder voids performed worse in solder joint reliability compared to test packages without solder voids.
一级互连中的空洞及其对焊点可靠性的影响
在一级互连(FLI)中存在空隙是一个未知的可靠性问题。本文介绍了在电迁移试验、热循环试验和热冲击试验中,对互连中空洞的形成、空洞检测的检测能力以及空洞对可靠性的影响进行了研究。这项工作的第一阶段已经使得定义可以一致地构建有或没有焊接空洞的测试包的工艺配方成为可能。x射线检查已被用来确定测试包装中的空隙程度。这项工作的第二阶段侧重于使测试包经受上述可靠性测试。对有焊隙的测试封装和无焊隙的测试封装进行了比较。从测试数据可以得出的结论是,与没有焊点空隙的测试封装相比,有焊点空隙的测试封装在焊点可靠性方面表现较差。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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