Giant piezoresistance effect in p-type silicon

T. T. T. Nghiêm, V. Aubry-Fortuna, C. Chassat, A. Bosseboeuf, P. Dollfus
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Abstract

This article presents a study of the giant piezoresistance effect in p-type silicon using full-band Monte Carlo simulation. This effect has been demonstrated experimentally in Si nanowires by He and Yang [1]. By introducing a law of variation of the surface potential according to the applied mechanical stress, we can reproduce this effect. The modulation of the width of the depletion region associated with the variation of surface potential induces a strong modulation of the total amount of carriers available for the conduction, which increases drastically this piezoresistive effect. This is probably the main origin of this effect, which may be used to achieve high performance MEMS sensors.
p型硅的巨压阻效应
本文采用蒙特卡罗模拟方法研究了p型硅的巨压阻效应。He和Yang[1]已经在硅纳米线中实验证明了这种效应。通过引入表面电位随外加机械应力的变化规律,我们可以再现这种效应。与表面电位变化相关的耗尽区宽度的调制引起了传导可用载流子总量的强调制,从而急剧增加了这种压阻效应。这可能是这种效应的主要来源,它可以用来实现高性能的MEMS传感器。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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