Numerical analysis of nano schottky junctions for developing novel sub-20 nm electronic devices

K. Eledlebi, M. Ismail, M. Rezeq
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引用次数: 2

Abstract

Nano metal-semiconductor contacts in sub-20 nm range have showed unusual electrical characteristics compared to conventional diodes. New devices based on nano Schottky junction have been proposed to overcome the limitations of CMOS devices. Here we introduce a new theoretical approach for studying the enhancement of the electric field at the interface, and then the net current along the junction. The results revealed a dominant tunneling current at the reverse bias for low n-dope semiconductor substrates. Whereas for high n-dope substrates, the thermionic current is dominant at the forward bias. We have used a finite element simulation software (COMSOL) to analyze the electrical characteristics of nano Schottky diodes, and compare the theoretical results with experimental data.
用于开发新型亚20nm电子器件的纳米肖特基结数值分析
与传统二极管相比,亚20nm范围内的纳米金属半导体触点表现出不同寻常的电特性。为了克服CMOS器件的局限性,提出了基于纳米肖特基结的新型器件。本文介绍了一种新的理论方法来研究界面处电场的增强,进而研究沿结处的净电流。结果表明,低氮掺杂半导体衬底在反向偏压处存在主导隧穿电流。而对于高氮掺杂的衬底,热离子电流在正向偏压处占主导地位。利用有限元仿真软件(COMSOL)对纳米肖特基二极管的电学特性进行了分析,并将理论结果与实验数据进行了比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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