Fluoropolymer platforms for 157 nm resist applications

Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468) Pub Date : 2001-10-31 DOI:10.1109/IMNC.2001.984193

H. Ito, G. Wallraff, N. Fender, P. Brock, H. Truong, C. Larson, B. D. Allen

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Abstract

This paper reports progress in the development of 157 nm chemically amplified positive resists, describing the polymer syntheses, polymer characterization (e.g. composition, molecular weight, thermal behavior, dissolution kinetics), and lithographic imaging. Our resists are based on α-trifluoromethylacrylic monomers and hexafluoroisopropanol which has a pKa similar to that of phenol.

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用于157纳米抗蚀应用的含氟聚合物平台

本文报道了157 nm化学放大正阻片的研究进展，描述了聚合物的合成、聚合物的表征(如组成、分子量、热行为、溶解动力学)和光刻成像。我们的抗蚀剂是基于α-三氟甲基丙烯酸单体和六氟异丙醇，其pKa与苯酚相似。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468)

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