Surface Imaging Resists: Promises, Practices and Prospects

Abstract

Surface imaging technology has the potential of providing enhanced resolution, larger process latitude and extending the capabilities of optical lithography tools. Surface imaging resist (SIR) processing in the form of the DESIRE process has been used at Texas Instruments for some time. Originally developed for g-line exposure tools (436 nm), it is now being used to push the capabilities of a 248 nm DUV stepper. In this paper the advantages of SIR are reviewed, the current practices described, and prospects for the future applications discussed.