Investigation of Femtosecond Pulse Induced Phase Transitions in GaAs

T. Schröder, P. Heist, S. Govorkov, I. Shumay, W. Rudolph
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Abstract

There has been a great deal of interest in the investigation of the primary steps of phase transitions at semiconductor surfaces excited by an ultrashort laser pulse. Raman experiments [1] revealed that energy from the electronic system is transferred to the phonon system (lattice) on a time scale of about 1-2ps. Direct observation of the sample surface after excitation showed the onset of melting to be within a few or less than 1ps [2]. Second harmonic generation in reflection turned out to be a powerful tool to detect symmetry changes of the sample surface [3-5]. The general observation is that the drop of the second harmonic efficiency occurs within the first one hundred fs after excitation. In contrast the reflectivity of the fundamental changes on a time scale of several hundred fs up to one ps depending on the excitation density. While the SHG probes only about a layer of lOnm the reflectivity of the fundamental is determined by a layer thickness of several hundred nm. Therefore one possible explanation for the different time constants rests on propagation effects of the melt front, another assumes an intermediate state reflecting a changed lattice symmetry which is reached before a considerable part of energy is transferred to the phonon system (cold melting) [3]. We supplemented pump-probe and time resolved SHG in reflection by transient grating measurements. The latter are extremly sensitive against propagation effects because they change the grating structure and thus the diffraction efficiency. Corresponding measurements are shown in Fig.l. It is intresting to note that observable first-order diffraction occured only at excitation densities above the melting threshold. From Fig.1 it is evident that the diffraction dynamics is similar to that of the fundamental reflection. A theoretical model explains this as a consequence of the fact that propagation effects can be neglected within the first few ps. An upper limit for the velocity of the melt front velocity can be estimated and is in the order of 500 m/s. Since the diffraction rise time of the UV-probe (310nm) is considerably longer than the decay of the second harmonic efficiency the existence of an intermediate state or phase prior the melting becomes even more likely.
飞秒脉冲诱导砷化镓相变的研究
在超短激光脉冲激发下半导体表面相变的主要步骤的研究引起了人们极大的兴趣。拉曼实验[1]揭示了电子系统的能量在大约1-2ps的时间尺度上转移到声子系统(晶格)。激发后对样品表面的直接观察表明,熔化的起始时间在几秒或小于1ps[2]。反射中的二次谐波产生是检测样品表面对称性变化的有力工具[3-5]。一般观察结果是,二次谐波效率的下降发生在激励后的前100秒内。相比之下,基本面的反射率在几百秒到1秒的时间尺度上随激发密度的变化而变化。虽然SHG只探测大约一层纳米,但基波的反射率是由几百纳米的层厚度决定的。因此,对不同时间常数的一种可能解释取决于熔体锋的传播效应,另一种假设是在相当一部分能量转移到声子系统(冷熔化)之前达到反映晶格对称性变化的中间状态[3]。我们通过瞬态光栅测量补充了泵浦探针和时间分辨SHG的反射。后者对传播效应非常敏感,因为它们改变了光栅结构,从而改变了衍射效率。相应测量结果如图1所示。有趣的是,观察到的一级衍射只发生在激发密度高于熔化阈值的情况下。从图1可以明显看出,衍射动力学与基反射相似。一个理论模型解释了这一点,因为在最初几秒内可以忽略传播效应。可以估计熔体前沿速度的上限,其数量级为500米/秒。由于紫外探针(310nm)的衍射上升时间比二次谐波效率的衰减时间长得多,因此更有可能存在熔化前的中间态或相。
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