Semi-insulating behaviour of n-type lightly Fe-doped InP wafers after thermal annealing

R. Fornari, A. Zappettini, E. Gombia, R. Mosca, M. Curti, K. Chearkaoui, G. Manakchi
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Abstract

As-grown Fe-doped semiconducting (SC) InP samples (residual carrier concentration /spl les/10/sup 15/ cm/sup -3/, estimated iron concentration 6-8/spl times/10/sup 15/ cm/sup -3/) were seen to convert to semi-insulating (SI), with high resistivity and good mobility, when annealed under appropriate conditions. This fact is very interesting since it gives the opportunity of obtaining semi-insulating InP with low Fe content. In this paper we report the annealing parameters together with the results of an extensive characterization (by Hall effect, C-V, IR absorption and PICTS) of the treated samples. The results suggest that the conductivity drop is related to a considerable loss of shallow donors.
n型轻掺铁InP晶圆热退火后的半绝缘性能
生长的掺铁半导体(SC) InP样品(残余载流子浓度/spl次/10/sup 15/ cm/sup -3/,估计铁浓度6-8/spl次/10/sup 15/ cm/sup -3/)在适当条件下退火后转化为半绝缘(SI),具有高电阻率和良好的迁移率。这一事实非常有趣,因为它提供了获得低铁含量半绝缘InP的机会。在本文中,我们报告了退火参数以及处理样品的广泛表征(通过霍尔效应,C-V,红外吸收和PICTS)的结果。结果表明,电导率的下降与浅层供体的大量损失有关。
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