PVT compensation in Mie Fujitsu 55 nm DDC: A standard-cell library based comparison

Abstract

In this paper we characterize the cross corner and cell to cell variation of a custom standard cell library (SCL) in Mie Fujitsu 55nm Deeply Depleted Channel (DDC) technology. Precharacterized Liberty library files are used as a dataset for comparing both the unbiased library against a characterization using adaptive body biasing (ABB) to compensate for process voltage and temperature (PVT) variation. Results show a reduction of the cross corner median delay variation from 2154% down to 18% with the application of ABB.