A. C. Liu, D. Pureur, M. Digonnet, G. Kino, E. Knystautas
{"title":"Improving the Nonlinearity of Silica by Poling at Higher Temperature and Voltage","authors":"A. C. Liu, D. Pureur, M. Digonnet, G. Kino, E. Knystautas","doi":"10.1364/bgppf.1997.btuc.5","DOIUrl":null,"url":null,"abstract":"Thermal poling of silica offers the exciting prospect of achieving, for the first time, low-loss electro-optic switches and modulators in a fiber form, devices that can be fusion spliced to a single mode fiber with negligible loss, unlike any other existing modulator. For this to become possible, both the depth (a few microns) and the nonlinear coefficient (0.5-1 pm/V) of the nonlinear region induced in silica by standard thermal poling must be increased. These objectives may be met by optimizing the glass composition and/or the poling process.","PeriodicalId":182420,"journal":{"name":"Bragg Gratings, Photosensitivity, and Poling in Glass Fibers and Waveguides: Applications and Fundamentals","volume":"151 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Bragg Gratings, Photosensitivity, and Poling in Glass Fibers and Waveguides: Applications and Fundamentals","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/bgppf.1997.btuc.5","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Thermal poling of silica offers the exciting prospect of achieving, for the first time, low-loss electro-optic switches and modulators in a fiber form, devices that can be fusion spliced to a single mode fiber with negligible loss, unlike any other existing modulator. For this to become possible, both the depth (a few microns) and the nonlinear coefficient (0.5-1 pm/V) of the nonlinear region induced in silica by standard thermal poling must be increased. These objectives may be met by optimizing the glass composition and/or the poling process.