Direct determination of the built-in polarization field in InGaN/GaN quantum wells

R. Schmidt, P. Kiesel, M. Kneissl, C. G. Van de Walle, N. Johnson, F. Renner, G. Dohler
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Abstract

Results of absorption and electroabsorption measurements on wurtzite (In)GaN light emitting diodes are reported. Despite the relatively high excitonic binding energy of 25 meV in GaN no pronounced excitonic features could be observed in the absorption spectra. Electroabsorption measurements were performed to study the field induced absorption changes both in the InGaN quantum wells and the GaN barriers. This technique allows precise determination of the strong internal field changes at the GaN/InGaN-hetero-interface that originate from strain-induced polarization and differences in spontaneous polarization. We find field-induced absorption changes as large as 7000 cm/sup -1/ below and almost 20000 cm/sup -1/ above the band edge. The deduced polarization fields vary between 1.1 and 1.4 MV/cm for indium concentrations in InGaN quantum wells ranging from 7% to 9%.
InGaN/GaN量子阱中内置偏振场的直接测定
报道了纤锌矿氮化镓发光二极管的吸收和电吸收测量结果。尽管氮化镓的激子结合能相对较高,达到25 meV,但在吸收光谱中没有观察到明显的激子特征。采用电吸收测量方法研究了InGaN量子阱和GaN势垒中的场致吸收变化。该技术可以精确测定GaN/ ingan异质界面上由应变诱导极化和自发极化差异引起的强内场变化。我们发现场致吸收变化大至7000 cm/sup -1/以下,近20000 cm/sup -1/以上。在铟浓度为7% ~ 9%的InGaN量子阱中,推导出的极化场在1.1 ~ 1.4 MV/cm之间变化。
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