Perspectives and issues in 3D-IC from designers' point of view

S. Fujita, K. Abe, K. Nomura, S. Yasuda, T. Tanamoto
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引用次数: 6

Abstract

Recent progress of through-silicon-via (TSV) process is so impressive that everyone can expect real 3D-IC era. The most valuable advantages of 3D-IC is decreasing interconnects. Although analysis of this advantages has been reported in some specific case study, the general theory for quantitative analysis has not been studied. In some cases, the advantage of 3D-IC has been overestimated and much different from that of real chip designs expected. This paper presents the qualitative analysis of general 3D-IC design especially for sub-65nm CMOS generation from designers' point of view. What is understood from this paper is how important IC-design is for 3D-IC and how to gain a big advantage of 3D-IC.
从设计师的角度来看3D-IC的观点和问题
通过硅通孔(TSV)工艺的最新进展令人印象深刻,每个人都可以期待真正的3D-IC时代。3D-IC最有价值的优势是减少互连。虽然在一些具体的案例研究中已经报道了对这一优势的分析,但尚未研究定量分析的一般理论。在某些情况下,3D-IC的优势被高估了,与实际芯片设计的预期相差甚远。本文从设计者的角度,对一般的3d集成电路设计,特别是65nm以下CMOS的设计进行了定性分析。通过本文的研究,可以了解到集成电路设计对于3d集成电路的重要性,以及如何利用3d集成电路的巨大优势。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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