{"title":"Achieving greater on-wafer S-parameter accuracy with the LRM calibration technique","authors":"A. Davidson, E. Strid, Keith Jones","doi":"10.1109/ARFTG.1989.323957","DOIUrl":null,"url":null,"abstract":"Since the Introduction of microwave wafer probing In 1983 the dominant vector network analyzer calibration technique has been the short-open-load-thru (SOLT). The thru-reflect-line (TRL) technique has also been used In certain applications, and both approaches have enabled valuable measurements to be made with relative ease and a high degree of accuracy. Each technique, however, has drawbacks which may hinder accuracy or prevent certain applications. A new method,' line-reflect-match (LRM), circumvents many of these drawbacks, thereby allowing a more accurate and more versatile on-wafer calibration. In addition, LRM is simpler to perform because it requires fewer standards.","PeriodicalId":153615,"journal":{"name":"34th ARFTG Conference Digest","volume":"35 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1989-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"79","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"34th ARFTG Conference Digest","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ARFTG.1989.323957","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 79
Abstract
Since the Introduction of microwave wafer probing In 1983 the dominant vector network analyzer calibration technique has been the short-open-load-thru (SOLT). The thru-reflect-line (TRL) technique has also been used In certain applications, and both approaches have enabled valuable measurements to be made with relative ease and a high degree of accuracy. Each technique, however, has drawbacks which may hinder accuracy or prevent certain applications. A new method,' line-reflect-match (LRM), circumvents many of these drawbacks, thereby allowing a more accurate and more versatile on-wafer calibration. In addition, LRM is simpler to perform because it requires fewer standards.