I. Bando, K. Koizumi, K. Daikohara, Y. Oikawal, V. A. Kulbachinski, H. Ozaki
{"title":"XPS study of oxidation process on Bi/sub 2/Te/sub 3/ surface","authors":"I. Bando, K. Koizumi, K. Daikohara, Y. Oikawal, V. A. Kulbachinski, H. Ozaki","doi":"10.1109/ICT.1999.843404","DOIUrl":null,"url":null,"abstract":"The oxidation process on the Bi/sub 2/Te/sub 3/ surface was investigated by X-ray photoelectron spectroscopy (XPS). The oxidized surface was found to have the Bi-O-Te structure with a definite thickness. The estimated oxide thicknesses from the XPS results were saturated at 1.5-2.0 nm, which was about two quintuple oxide layers thick in our oxide model. Experimental data were compared to a modified Cabrera-Mott oxidation rate model and the oxidation time dependence of the oxide thickness could be fitted very well.","PeriodicalId":253439,"journal":{"name":"Eighteenth International Conference on Thermoelectrics. Proceedings, ICT'99 (Cat. No.99TH8407)","volume":"11 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1999-08-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Eighteenth International Conference on Thermoelectrics. Proceedings, ICT'99 (Cat. No.99TH8407)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICT.1999.843404","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
The oxidation process on the Bi/sub 2/Te/sub 3/ surface was investigated by X-ray photoelectron spectroscopy (XPS). The oxidized surface was found to have the Bi-O-Te structure with a definite thickness. The estimated oxide thicknesses from the XPS results were saturated at 1.5-2.0 nm, which was about two quintuple oxide layers thick in our oxide model. Experimental data were compared to a modified Cabrera-Mott oxidation rate model and the oxidation time dependence of the oxide thickness could be fitted very well.