Early voltage and intrinsic voltage gain in vertical nanowire-TFETs as a function of temperature

M. D. V. Martino, F. Neves, P. Agopian, J. Martino, A. Vandooren, R. Rooyackers, E. Simoen, A. Thean, C. Claeys
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引用次数: 1

Abstract

The goal of this work is to study parameters related to the analog performance of tunnel field effect transistors (TFETs). The obtained results have been analyzed in terms of temperature variation (ranging from 25°C to 150°C) and source composition (Sh-xGex and 100% Si). The first part is focused on characteristic curves of the drain current as a function of gate voltage and drain voltage. Next step highlights the Early voltage and the ratio of transconductance and drain current, since these parameters lead to the extraction of the intrinsic voltage gain. Performing a temperature analysis, different trends have been obtained depending on the device. For instance, devices with 100% Si source and non-abrupt junction profile present the lowest gain at room temperature, but the best results for temperatures higher than 100°C. The suitability of TFETs for analog applications has been discussed based on these results.
垂直纳米线tfet的早期电压和本征电压增益随温度的变化
本工作的目的是研究与隧道场效应晶体管(tfet)模拟性能相关的参数。根据温度变化(范围从25°C到150°C)和源成分(Sh-xGex和100% Si)对所得结果进行了分析。第一部分重点研究了漏极电流随栅极电压和漏极电压的特性曲线。下一步强调早期电压和跨导和漏极电流的比率,因为这些参数导致提取固有电压增益。执行温度分析,根据设备的不同,得到了不同的趋势。例如,具有100% Si源和非突变结轮廓的器件在室温下具有最低的增益,但在高于100°C的温度下具有最佳效果。基于这些结果,讨论了tfet在模拟应用中的适用性。
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