Single step fabrication of nano-structured superhydrophobic surfaces showing angle dependent colours

A. Tripathy, Ankur Goswami, P. Sen
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引用次数: 2

Abstract

Superhydrophobic surfaces show extraordinary water-repellent properties with low drag for fluid flow due to reduced liquid-solid contact area. Due to high contact angle and low contact angle hysteresis these surfaces also show self-cleaning effect. In nature different plants and leaves, such as Lotus leaf and Rose petals show superhydrophobic behaviour due to wax coated micro/nano hierarchical structures on their surfaces. In this work, we report fabrication of superhydrophobic surfaces on silicon substrate using a one step process. This is a wafer scale large area fabrication technique for superhydrophobic surfaces. DRIE (Deep Reactive Ion Etching) technique was used to fabricate the nano structured extremely water repellent surfaces. Two different fabrication approaches have been followed in this work. In one approach the DRIE was carried out directly on silicon surface and in the second approach DRIE was done after spin coating alumina nanoparticles dissolved in ethanol on silicon surface. In both the processes, DRIE was done for a different number of etch cycles. The width of the nano-structures formed after DRIE process varies in the range of 300 nm to 500 nm. Contact angle has been measured and compared for the superhydrophobic surfaces fabricated using the above two approaches. Contact angle as high as 170°±1° was measured and less than 2° contact angle hysteresis was observed for water droplet. Also an angle dependent colour change phenomena, which was observed for the nano structured silicon substrates obtained using the second approach at different viewing angles is reported.
单步制备具有角度依赖颜色的纳米结构超疏水表面
由于减少了液固接触面积,超疏水表面表现出非凡的拒水性,流体流动阻力小。由于高接触角和低接触角滞后,这些表面也表现出自清洁效果。在自然界中,不同的植物和叶子,如荷叶和玫瑰花瓣,由于其表面涂有蜡的微/纳米分层结构而表现出超疏水行为。在这项工作中,我们报告了用一步法在硅衬底上制备超疏水表面。这是一种超疏水表面的晶圆级大面积制造技术。采用深度反应离子刻蚀(Deep Reactive Ion Etching)技术制备了纳米结构的极拒水表面。在这项工作中采用了两种不同的制造方法。一种方法是直接在硅表面进行DRIE,另一种方法是将氧化铝纳米粒子溶解在乙醇中自旋涂覆在硅表面。在这两种工艺中,DRIE进行了不同数量的蚀刻循环。经过DRIE工艺形成的纳米结构的宽度在300 ~ 500 nm之间变化。对采用上述两种方法制备的超疏水表面的接触角进行了测量和比较。水滴接触角可达170°±1°,接触角迟滞小于2°。此外,本文还报道了用第二种方法在不同视角下观察到的纳米结构硅衬底颜色变化的角度依赖性现象。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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