R. D. de Ridder, C. Bostan, H. van Wolferen, I. van Dorssen, L. Vogelaar, F. Segerink, L. Kuipers, N. V. van Hulst
{"title":"Fabrication of photonic crystal slabs and defects using laser interference lithography and focused ion beam-assisted deposition","authors":"R. D. de Ridder, C. Bostan, H. van Wolferen, I. van Dorssen, L. Vogelaar, F. Segerink, L. Kuipers, N. V. van Hulst","doi":"10.1109/ICTON.2002.1007836","DOIUrl":null,"url":null,"abstract":"A method is described for fabricating photonic crystal slabs, using a combination of laser interference lithography for generating a regular periodic structure (the crystal lattice), and focused ion beam-assisted deposition for defining defects in this lattice, which may act as waveguides or resonators. As an example, results will be shown of a photonic crystal slab with a line defect in silicon nitride.","PeriodicalId":126085,"journal":{"name":"Proceedings of 2002 4th International Conference on Transparent Optical Networks (IEEE Cat. No.02EX551)","volume":"6 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2002-08-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"9","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of 2002 4th International Conference on Transparent Optical Networks (IEEE Cat. No.02EX551)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICTON.2002.1007836","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 9
Abstract
A method is described for fabricating photonic crystal slabs, using a combination of laser interference lithography for generating a regular periodic structure (the crystal lattice), and focused ion beam-assisted deposition for defining defects in this lattice, which may act as waveguides or resonators. As an example, results will be shown of a photonic crystal slab with a line defect in silicon nitride.