Precision micro-machining of silicon and glass

V. C. Venkatesh, S. Izman, S. Sharif, T. Mon, M. Konneh
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引用次数: 4

Abstract

This research work is concentrated on machining of flat surfaces on silicon and glass for applications like IC chips and small optical lenses. Aspheric surfaces were also generated on silicon and germanium. Grinding was done to give a good surface finish and at the same time focused on getting the maximum amount of ductile streaks. After grinding the surfaces were lapped and polished. The polishing curve is a saturation curve where rapid improvement in surface finish is obtained followed by a gradual decrease in the Ra, with the curve flattening out parallel to the horizontal time axis. It was found that the initial roughness after grinding was not the sole criterion for rapid polishing but rather the amount of ductile streaks. The amount of ductile streaks is not only dependant on the feed and the depth of cut but also on the grit size of the diamonds as well as its concentration, and not least of all on the type of bond. Brightness of silicon surfaces and lightness of glass workpieces and their relationship with roughness have been determined.
硅和玻璃的精密微加工
这项研究工作主要集中在硅和玻璃的平面加工上,用于集成电路芯片和小型光学透镜等应用。在硅和锗上也产生了非球面。进行研磨是为了获得良好的表面光洁度,同时专注于获得最大数量的延展性条纹。研磨后的表面被研磨和抛光。抛光曲线是一条饱和曲线,其中表面光洁度得到快速改善,随后Ra逐渐下降,曲线平行于水平时间轴变平。研究发现,磨削后的初始粗糙度不是快速抛光的唯一标准,而是延展性条纹的数量。延展性条纹的数量不仅取决于进给量和切割深度,而且还取决于钻石的粒度及其浓度,尤其是取决于结合的类型。确定了硅表面的亮度和玻璃工件的亮度及其与粗糙度的关系。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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